Niobium thin film thickness profile tailoring on complex shape substrates using unbalanced biased High Power Impulse Magnetron Sputtering
نویسندگان
چکیده
The authors report in this paper the possibility to control thickness profile of a thin film deposited by High Power Impulse Magnetron Sputtering (HiPIMS). It is shown that combination between HiPIMS discharge, an unbalanced magnetic configuration and application negative bias onto surface coat enables tailoring on demand coating profile. This effect hereafter used complex shapes such as low-beta accelerating cavities with niobium layer. first present design proposed obtain cylindrical sputtering source. Numerical simulations are then predict electron density energy spatial distributions can subsequently be correlated ionization region shape. Finally, technique comparing Direct Current (DCMS), biased using, respectively, balanced configuration, well detailing modifying either field lines distribution or strength. • Fabrication simulation magnetron Ionization shape predicted PICMC Coating DCMS independent substrate biasing. modified combining Homogeneity fine-tuned using HiPIMS.
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ژورنال
عنوان ژورنال: Surface & Coatings Technology
سال: 2022
ISSN: ['1879-3347', '0257-8972']
DOI: https://doi.org/10.1016/j.surfcoat.2022.128306